This project is dedicated to demonstrate diblock copolymer lithography assisted SAG of QDs. We explore a new diblock-copolymer, which is after oxygen plasma treatment transform into silicon oxycarbide mask. This mask can be directly used in MOVPE.
This project comprises the work in the clean room on developing and optimization of diblock copolymer lithography assisted epitaxial growth and following optical and morphological characterization of QD materials.
Knowledge of solid state/semiconductor physics